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Nanofabricatio
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Specificaties
- Objectstaat
- Book Title
- Nanofabrication Using Focused Ion and Electron Beams: Principles
- ISBN
- 9780199734214
- Subject Area
- Technology & Engineering, Science
- Publication Name
- Nanofabrication Using Focused Ion and Electron Beams : Principles and Applications
- Publisher
- Oxford University Press, Incorporated
- Item Length
- 7.4 in
- Subject
- Nanotechnology & Mems, Chemical & Biochemical, Physics / Nuclear
- Publication Year
- 2012
- Series
- Oxford Series in Nanomanufacturing Ser.
- Type
- Textbook
- Format
- Hardcover
- Language
- English
- Item Height
- 1.9 in
- Item Weight
- 76.1 Oz
- Item Width
- 10.1 in
- Number of Pages
- 840 Pages
Over dit product
Product Identifiers
Publisher
Oxford University Press, Incorporated
ISBN-10
0199734216
ISBN-13
9780199734214
eBay Product ID (ePID)
102926968
Product Key Features
Number of Pages
840 Pages
Language
English
Publication Name
Nanofabrication Using Focused Ion and Electron Beams : Principles and Applications
Publication Year
2012
Subject
Nanotechnology & Mems, Chemical & Biochemical, Physics / Nuclear
Type
Textbook
Subject Area
Technology & Engineering, Science
Series
Oxford Series in Nanomanufacturing Ser.
Format
Hardcover
Dimensions
Item Height
1.9 in
Item Weight
76.1 Oz
Item Length
7.4 in
Item Width
10.1 in
Additional Product Features
Intended Audience
Scholarly & Professional
LCCN
2011-028174
Reviews
The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little morebesides.
Dewey Edition
23
Number of Volumes
1 vol.
Illustrated
Yes
Dewey Decimal
620.115
Table Of Content
Introduction1-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials1-2. Historical evolution of FIB technology: from circuit editing to nanoprototypingPart I1. The theory of bright field electron and field ion emission sources2. How to select compounds for focused charged particle beam assisted etching and deposition3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment4. Fundamentals of interactions of electrons with molecules5. Simulation of focused ion beam milling6. FEB and FIB continuum models for one molecule species7. Continuum modeling of electron beam induced processes8. Monte Carlo method in EBID process simulationsPart II9. Focused electron beam induced processing (FEBIP) for industrial applications10. Focused Ion Beam and DualBeamTM technology applied to nanoprototyping11. Review of FIB-tomography12. In-situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and ion- assisted metal deposition for the fabrication of nanodevices based on individual nanowires15. Focused ion beam fabrication of carbon nanotube and ZnO nanodevices16. Focused Ion and Electron Beam induced deposition of magnetic nanostructures17. Metal films deposited by FIB and FEB for nanofabrication and nanocontacting purposes18. FIB Etching for Photonic Device Applications19. Gas assisted FIB etching of InP for rapid-prototyping of photonic crystals20. Applications of FIB for rapid prototyping of photonic devices, fabrication of nano sieve, nanowire and nano antennas21. Focused particle beam induced deposition of silicon dioxide22. Growth and characterization of FEB-deposited suspended nanostructures23. Electrical transport properties of metallic nanowires and nanoconstrictions created with FIB24. Structure-property relationship in electronic transport on FEBID structures25. Characterization of nanostructured carbon materials using FIB26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication using Electron Beam Lithography Processes
Synopsis
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules., Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
LC Classification Number
TA418.9.N35N2525
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